photomask alignment

См. также в других словарях:

• Contact lithography — Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. Contents 1… …   Wikipedia

• Stepper — A stepper is a device used in the manufacture of integrated circuits (ICs) that is similar in operation to a slide projector or a photographic enlarger. Steppers are an essential part of the complex process, called photolithography, that creates… …   Wikipedia

• Microelectromechanical systems — (MEMS) (also written as micro electro mechanical, MicroElectroMechanical or microelectronic and microelectromechanical systems) is the technology of very small mechanical devices driven by electricity; it merges at the nano scale into… …   Wikipedia

• Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… …   Wikipedia

• Nanoimprint lithography — is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint… …   Wikipedia

• Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… …   Wikipedia

• Magnetolithography — (ML) is a method for pattern surfaces. ML based on applying a magnetic field on the substrate using paramagnetic metal masks named magnetic mask . Magnetic mask which is analog to photomask define the spatial distribution and shape of the applied …   Wikipedia